Keith A. Klinedinst

Keith Klinedinst
Title: Chemist
Company: Osram Sylvania
Location: Hudson, Massachusetts, United States

Keith A. Klinedinst, PhD, Staff Scientist at Osram Sylvania, has been recognized by Marquis Who’s Who Top Scientists for dedication, achievements, and leadership in chemistry.

Upon developing an early interest in the physical sciences and mathematics, Dr. Klinedinst found that he enjoyed industrial research and the development of novel processes and products. A renowned scientist, Dr. Klinedinst is the primary inventor of more than 40 U.S. patents in fields of thin film deposition, protective coatings, optical coatings, electrochemical technology, and lighting technology. Most recently in his career, he served as a staff scientist at Osram Sylvania in Danvers, Massachusetts from 1993 to 2006. Prior, he was a principal and technical staff member of GTE Laboratories’ Materials Science Laboratory from 1976 to 1993, and a research associate at United Technical Corporation’s Advanced Fuel Cell Research Laboratory from 1972 to 1976.

Dr. Klinedinst received a Bachelor of Science in chemistry from Franklin & Marshall College in 1966 and went on to attend Stanford University, where he obtained a Master of Science in chemistry in 1968 and a Doctor of Philosophy in chemistry in 1972. Later on, he achieved a second Master of Science in computer science from Boston University in 1987. Looking back on his illustrious career, Dr. Klinedinst is most proud of winning the Leslie H. Warner Technical Achievement Award and Osram Star Award, as well as his Woodrow Wilson Fellowship. A prolific writer in addition to his scientific research capabilities, he has authored more than 40 journal and proceedings articles in the fields of fuel cell and battery technology, materials science, thermodynamics, and luminescence. A member of the American Chemical Society, Electrochemical Society, Sigma Xi, and Phi Beta Kappa, Dr. Klinedinst and his accomplishments can also be found in the first edition of Who’s Who in Science and Engineering.

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